29 May 2012 Tabletop storage ring MIRRORCLE extreme ultraviolet lithography source
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Abstract
Advances of tabletop electron storage rings for generating a brilliant extreme ultraviolet (EUV) or soft x-ray beam are discussed. An electron storage ring called MIRRORCLE-20SX currently provides a stored beam current with an average of 3 A, a 1-minute lifetime, 15 ms radiation damping time, and a beam size of about 3×3 mm2. We generate EUV by a thin-film target placed in the electron orbit. Photons in the wavelength around 13.9 nm is generated by an Si thin film, and 4.3 nm by a diamond-like carbon (DLC) film placed in the circulating electron beam. It is known from previous experimental studies that the mechanism of EUV emission is a synchrotron Cherenkov radiation (SCR). The observed photon power is 14 W/sr by the DLC film. We report that SCR is suitable for EUV lithography (EUVL) because the spectrum is monochromatic, the radiation angular spread is as narrow as 20×5 mrad2, and the emitter size can be 0.01×3 mm2. An optimized EUV source for lithography based on the tabletop synchrotron is proposed.
© 2012 Society of Photo-Optical Instrumentation Engineers (SPIE)
Hironari Yamada, Hironari Yamada, Dorian Minkov, Dorian Minkov, Taichi Hayashi, Taichi Hayashi, Daisuke Hasegawa, Daisuke Hasegawa, } "Tabletop storage ring MIRRORCLE extreme ultraviolet lithography source," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(2), 021121 (29 May 2012). https://doi.org/10.1117/1.JMM.11.2.021121 . Submission:
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