3 May 2012 Design of high brightness laser-Compton source for extreme ultraviolet and soft x-ray wavelengths
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Abstract
Design of a clean, high-brightness light source is presented for extreme ultraviolet/soft x-ray (EUV/SXR) lithography research and mask inspection. Basic characteristics of classical laser-Compton scattering are reviewed, and the laser and electron beam parameters at relatively low energy (EUV to SXR) photon generation are optimized. Recent achievements in each component technology are evaluated on a continuous wave (CW)-operated electron linac and energy recovery linac system, based on superconducting technologies at a 1.3 GHz operation frequency, 10 kW average power, short pulse CO2 laser, and optical super cavity with a 600- enhancement- factor at 10.6 μm wavelength. Combining both the CW electron beam and short pulse CO2 laser with super-cavity enhancement, 1  mW/2%  ?startb.w.end? flux and 30  kW/mm2/sr/2%  ?startb.w.end? brightness laser-Compton source is designed at 6.7-nm wavelength. The technological gap in the present component technologies are discussed, as well as any further required developments.
© 2012 Society of Photo-Optical Instrumentation Engineers (SPIE)
Kazuyuki Sakaue, Kazuyuki Sakaue, Akira Endo, Akira Endo, Masakazu Washio, Masakazu Washio, } "Design of high brightness laser-Compton source for extreme ultraviolet and soft x-ray wavelengths," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(2), 021124 (3 May 2012). https://doi.org/10.1117/1.JMM.11.2.021124 . Submission:
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