7 August 2012 Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography
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Abstract
A block copolymer-directed self-assembly was combined with nanoimprint lithography to generate templates with rectangular patterns through an original double imprint process. A rotary e-beam tool was used to separately expose circumferential and radial line/space chemical contrast patterns with periodicities commensurate to the natural period of two lamellae-forming poly(styrene-b-methyl methacrylate) (PS-b-PMMA) block copolymers. Line patterns are formed by directed self-assembly of PS-b-PMMA on chemical patterns on two separate submaster templates, one with circumferential lines to define concentric tracks, and a second template on which the block copolymer is used to form radial lines at constant angular pitch. The patterns are subsequently transferred to their underlying Si substrates to form submaster templates. Using two sequential nanoimprinting steps, the radial and circumferential submaster line patterns were combined into a final quartz master template with rectangular bits on circular tracks.
© 2012 Society of Photo-Optical Instrumentation Engineers (SPIE)
Lei Wan, Lei Wan, Ricardo Ruiz, Ricardo Ruiz, He H. Gao, He H. Gao, Kanaiyalal C. Patel, Kanaiyalal C. Patel, Jeffery Lille, Jeffery Lille, Gabriel Zeltzer, Gabriel Zeltzer, Elizabeth A. Dobisz, Elizabeth A. Dobisz, Alexei Bogdanov, Alexei Bogdanov, Thomas R. Albrecht, Thomas R. Albrecht, Paul F. Nealey, Paul F. Nealey, } "Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(3), 031405 (7 August 2012). https://doi.org/10.1117/1.JMM.11.3.031405 . Submission:
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