CONFERENCE PROCEEDINGS
Advanced Search
Home > Journals > J. Micro/Nanolith. MEMS MOEMS > Volume 12 > Issue 3 > Article
Open Access
12 August 2013 High-performance wire-grid polarizers using jet and Flash™ imprint lithography
Se Hyun Ahn, Shuqiang Yang, Mike Miller, Maha Ganapathisubramanian, Marlon Menezes, Jin H. Choi, Frank Y. Xu, Douglas J. Resnick, S. V. Sreenivasan
Author Affiliations +
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 12, Issue 3, 031104 (August 2013). https://doi.org/10.1117/1.JMM.12.3.031104
Abstract
Extremely large-area roll-to-roll (R2R) manufacturing on flexible substrates is ubiquitous for applications such as paper and plastic processing. It combines the benefits of high speed and inexpensive substrates to deliver a commodity product at low cost. The challenge is to extend this approach to the realm of nanopatterning and realize similar benefits. In order to achieve low-cost nanopatterning, it is imperative to move toward high-speed imprinting, less complex tools, near zero waste of consumables, and low-cost substrates. We have developed a roll-based J-FIL process and applied it to a technology demonstrator tool, the LithoFlex 100, to fabricate large-area flexible bilayer wire-grid polarizers (WGPs) and high-performance WGPs on rigid glass substrates. Extinction ratios of better than 10,000 are obtained for the glass-based WGPs. Two simulation packages are also employed to understand the effects of pitch, aluminum thickness, and pattern defectivity on the optical performance of the WGP devices. It is determined that the WGPs can be influenced by both clear and opaque defects in the gratings; however, the defect densities are relaxed relative to the requirements of a high-density semiconductor device.
CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.
Citation Download Citation
Se Hyun Ahn, Shuqiang Yang, Mike Miller, Maha Ganapathisubramanian, Marlon Menezes, Jin H. Choi, Frank Y. Xu, Douglas J. Resnick, and S. V. Sreenivasan "High-performance wire-grid polarizers using jet and Flash™ imprint lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 12(3), 031104 (12 August 2013). https://doi.org/10.1117/1.JMM.12.3.031104
Published: 12 August 2013
JOURNAL ARTICLE
 10 PAGES
DOWNLOAD PAPER SAVE TO MY LIBRARY
GET CITATION
Lens.org Logo
CITATIONS
Cited by 21 scholarly publications and 3 patents.
Advertisement
Advertisement
KEYWORDS
Polarizers
Lithography
Aluminum
Nanostructures
Etching
Nanoimprint lithography
Opacity
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top