Periodic patterning using aerial image modulation with optical lithography

Boyan Penkov; Garry J. Bordonaro; Andrii B. Golovin; Igor Bendoym; Donald M. Tennant; David T. Crouse

doi:10.1117/1.JMM.12.3.033009

2 August 2013 Periodic patterning using aerial image modulation with optical lithography

Boyan Penkov, Garry J. Bordonaro, Andrii B. Golovin, Igor Bendoym, Donald M. Tennant, David T. Crouse

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 12, Issue 3, 033009 (August 2013). https://doi.org/10.1117/1.JMM.12.3.033009

Abstract

Photolithography for patterns with periodicity in the illumination plane (2.5-D lithography) has seen rapid advances over the past decade, with the introduction of holographic lithography and the further development of phase-contrast and grayscale photolithography methods. However, each of these techniques suffers from substantial difficulties preventing further integration into device fabrication: a lack of parallel processing capabilities and dimension limitations. Here, we present a demonstration of controlled layer topography through modulation of both the exposure dose and exposure focal plane yielding reproducible 2.5-D patterns which are applied to the further development of plasmonic gratings. This process is entirely compatible with commercially available i -line photolithography and etch hardware, enabling a path to ready integration.

CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Boyan Penkov, Garry J. Bordonaro, Andrii B. Golovin, Igor Bendoym, Donald M. Tennant, and David T. Crouse "Periodic patterning using aerial image modulation with optical lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 12(3), 033009 (2 August 2013). https://doi.org/10.1117/1.JMM.12.3.033009

Published: 2 August 2013

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