Measurement configuration optimization for accurate grating reconstruction by Mueller matrix polarimetry

Xiuguo Chen; Shiyuan Liu; Chuanwei Zhang; Hao Jiang

doi:10.1117/1.JMM.12.3.033013

19 August 2013 Measurement configuration optimization for accurate grating reconstruction by Mueller matrix polarimetry

Xiuguo Chen, Shiyuan Liu, Chuanwei Zhang, Hao Jiang

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 12, Issue 3, 033013 (August 2013). https://doi.org/10.1117/1.JMM.12.3.033013

Abstract

Due to the rich information provided by the Mueller matrices when the most general conical diffraction configuration is considered, the Mueller matrix polarimetry has demonstrated a great potential in semiconductor manufacturing. As the configurations of the incidence and azimuthal angles have different influences on the measurement accuracy, it is necessary to select an optimal one among the multitude of possible options. We introduce the norm of a configuration error propagating matrix to assess the measurement accuracy for different measurement configurations. The optimal configuration for a Si grating sample was achieved by minimizing the norm of the configuration error propagating matrix. Experimental results show the agreement between the theoretically predicted optimal configuration and the experimental exhibited one obtained by using a dual-rotating compensator Mueller matrix polarimeter and thus demonstrated the validity of the proposed optimization method.

CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

Citation Download Citation

Xiuguo Chen, Shiyuan Liu, Chuanwei Zhang, and Hao Jiang "Measurement configuration optimization for accurate grating reconstruction by Mueller matrix polarimetry," Journal of Micro/Nanolithography, MEMS, and MOEMS 12(3), 033013 (19 August 2013). https://doi.org/10.1117/1.JMM.12.3.033013

Published: 19 August 2013

ACCESS THE FULL ARTICLE

JOURNAL ARTICLE
7 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

CITATIONS

Cited by 30 scholarly publications and 1 patent.

Explore citations on Lens.org

KEYWORDS

Error analysis

Mueller matrices

Polarimetry

Silicon

Chemical elements

Statistical analysis

Scanning electron microscopy

Show All Keywords

RELATED CONTENT

Measurement configuration optimization for grating reconstruction by Mueller matrix polarimetry
Proceedings of SPIE (April 10 2013)

Mueller matrix elements error distribution for polarimetric measurements
Proceedings of SPIE (December 12 2003)

Robust characterization of small grating boxes using rotating stage Mueller...
Proceedings of SPIE (April 01 2010)

Complete and incomplete imaging Mueller matrix polarimetry of homogeneous anisotropic...
Proceedings of SPIE (June 20 2007)

Modern identification algorithm to reduce the complexity of parameter estimation...
Proceedings of SPIE (July 09 1992)

Characterization of gratings by Mueller polarimetry in conical diffraction
Proceedings of SPIE (May 10 2005)

Subscribe to Digital Library

Receive Erratum Email Alert

Show All Keywords

Keywords/Phrases

Search In:

Publication Years