17 March 2014 Diffusion-induced structural changes in La/B-based multilayers for 6.7-nm radiation
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Abstract
The thermal stability of La/B and LaN/B multilayers was investigated. The two multilayer systems were found to have comparable subångström period expansion upon annealing in the temperature range of 250°C to 400°C. For La/B multilayers, wide angle x-ray diffraction analysis revealed that the size of LaB 6 crystallites present did not change significantly upon thermal treatment. Using grazing incidence x-ray reflectometry, strong change in the internal structure due to interdiffusion at the interfaces of La/B multilayers was observed after annealing. This, coupled to the unchanged crystallinity, suggested the growth of amorphous lanthanum boride interlayers. At wavelength reflectance, measurements showed that as-deposited LaN/B multilayers had an enhanced optical contrast compared with La/B. During thermal loading, the rate of diffusion-induced reflectance decrease in LaN/B multilayers was slower than in La/B. The enhanced thermal stability of LaN/B was attributed to the slower growth of LaN-B interfaces compared with La-B.
© 2014 Society of Photo-Optical Instrumentation Engineers (SPIE)
Steven L. Nyabero, Steven L. Nyabero, Robbert W. van de Kruijs, Robbert W. van de Kruijs, Andrey E. Yakshin, Andrey E. Yakshin, Igor A. Makhotkin, Igor A. Makhotkin, Jeroen Bosgra, Jeroen Bosgra, Fred Bijkerk, Fred Bijkerk, } "Diffusion-induced structural changes in La/B-based multilayers for 6.7-nm radiation," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(1), 013014 (17 March 2014). https://doi.org/10.1117/1.JMM.13.1.013014 . Submission:
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