18 July 2014 Nanoimprint lithography process chains for the fabrication of micro- and nanodevices
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Abstract
The nanoimprint lithography (NIL) process with its key elements molding and thin film pattern transfer refers to the established process chain of resist-based patterning of hard substrates. Typical processes for mass fabrication are either wafer-scale imprint or continuous roll-to-roll processes. In contrast to this, similar process chains were established for polymeric microelements fabricated by injection molding, particularly when surface topographies need to be integrated into monolithic polymer elements. NIL needs to be embedded into the framework of general replication technologies, with sizes ranging from nanoscopic details to macroscopic entities. This contribution presents elements of a generalized replication process chain involving NIL and demonstrates its wide application by presenting nontypical NIL products, such as an injection-molded microcantilever. Additionally, a hybrid approach combining NIL and injection molding in a single tool is presented. Its aim is to introduce a toolbox approach for nanoreplication into NIL-based processing and to facilitate the choice of suitable processes for micro- and nanodevices. By proposing a standardized process flow as described in the NaPANIL library of processes, the use of establish process sequences for new applications is facilitated.
© 2014 Society of Photo-Optical Instrumentation Engineers (SPIE)
Helmut Schift, Prabitha Urwyler, Per Magnus Kristiansen, Jens Gobrecht, "Nanoimprint lithography process chains for the fabrication of micro- and nanodevices," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(3), 031303 (18 July 2014). https://doi.org/10.1117/1.JMM.13.3.031303 . Submission:
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