5 September 2014 Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography
Author Affiliations +
J. of Micro/Nanolithography, MEMS, and MOEMS, 13(3), 033013 (2014). doi:10.1117/1.JMM.13.3.033013
Abstract
Numerous studies report the importance of nanoscale metallic features to increase the sensitivity of gas sensors, biodetectors, and for the fabrication of the new-generation plasmonic devices. So far, nanoimprint lithography has not shown the capability to pattern a metallic structure that would both be sub-15 nm and sufficiently thick to ensure electrical conductance. To overcome these limitations, we report a step and repeat nanoimprint lithography (SR-NIL) on a pre-spin-coated layer stack. This work reports the fabrication of sub-15-nm lines that are 15-nm thick and have a 50-nm-half-pitch grating with 35-nm-thick metal, which represents the new state of the art for SR-NIL.
© 2014 Society of Photo-Optical Instrumentation Engineers (SPIE)
Giuseppe Calafiore, Scott Dhuey, Simone Sassolini, Nerea Alayo, David Gosselin, Marko Vogler, Deidre L. Olynick, Christophe Peroz, Stefano Cabrini, "Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(3), 033013 (5 September 2014). http://dx.doi.org/10.1117/1.JMM.13.3.033013
JOURNAL ARTICLE
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KEYWORDS
Metals

Nanoimprint lithography

Multilayers

Etching

Polymethylmethacrylate

Optical lithography

Plasma

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