5 September 2014 Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography
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Abstract
Numerous studies report the importance of nanoscale metallic features to increase the sensitivity of gas sensors, biodetectors, and for the fabrication of the new-generation plasmonic devices. So far, nanoimprint lithography has not shown the capability to pattern a metallic structure that would both be sub-15 nm and sufficiently thick to ensure electrical conductance. To overcome these limitations, we report a step and repeat nanoimprint lithography (SR-NIL) on a pre-spin-coated layer stack. This work reports the fabrication of sub-15-nm lines that are 15-nm thick and have a 50-nm-half-pitch grating with 35-nm-thick metal, which represents the new state of the art for SR-NIL.
© 2014 Society of Photo-Optical Instrumentation Engineers (SPIE)
Giuseppe Calafiore, Giuseppe Calafiore, Scott Dhuey, Scott Dhuey, Simone Sassolini, Simone Sassolini, Nerea Alayo, Nerea Alayo, David Gosselin, David Gosselin, Marko Vogler, Marko Vogler, Deidre L. Olynick, Deidre L. Olynick, Christophe Peroz, Christophe Peroz, Stefano Cabrini, Stefano Cabrini, } "Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(3), 033013 (5 September 2014). https://doi.org/10.1117/1.JMM.13.3.033013 . Submission:
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