6 November 2014 Hybrid metrology: from the lab into the fab
Author Affiliations +
The accelerated pace of the semiconductor industry in recent years is putting a strain on existing dimensional metrology equipment (such as critical dimension-secondary electron microscopy, atomic force microscopy, scatterometry) to keep up with ever-increasing metrology challenges. However, a revolution appears to be forming with the recent advent of hybrid metrology (HM). We highlight some of the challenges and lessons learned when setting up a standard HM solution and describe the first-in-industry implementation of HM within a high-volume manufacturing environment.
© 2014 Society of Photo-Optical Instrumentation Engineers (SPIE)
Alok Vaid, Alok Vaid, Alexander Elia, Alexander Elia, Givantha Iddawela, Givantha Iddawela, Cornel Bozdog, Cornel Bozdog, Matthew J. Sendelbach, Matthew J. Sendelbach, Byungcheol Kang, Byungcheol Kang, Paul K. Isbester, Paul K. Isbester, Shay Wolfling, Shay Wolfling, "Hybrid metrology: from the lab into the fab," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(4), 041410 (6 November 2014). https://doi.org/10.1117/1.JMM.13.4.041410 . Submission:


Back to Top