CONFERENCE PROCEEDINGS
Advanced Search
Home > Journals > J. Micro/Nanolith. MEMS MOEMS > Volume 13 > Issue 4 > Article
Open Access
2 December 2014 Techniques for improving overlay accuracy by using device correlated metrology targets as reference
Wei Jhe Tzai, Simon C. C. Hsu, Howard Chen, Charlie Chen, Yuan Chi Pai, Chun-Chi Yu, Chia-Ching Lin, Tal Itzkovich, Lipkong Yap, Eran Amit, David Tien, Eros Huang, Kelly T. L. Kuo, Nuriel Amir
Author Affiliations +
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 13, Issue 4, 041412 (December 2014). https://doi.org/10.1117/1.JMM.13.4.041412
Abstract
The performance of overlay metrology as total measurement uncertainty, design rule compatibility, device correlation, and measurement accuracy has been challenged at the 2× nm node and below. The process impact on overlay metrology is becoming critical, and techniques to improve measurement accuracy become increasingly important. We present a methodology for improving the overlay accuracy. A propriety quality metric, Qmerit, is used to identify overlay metrology measurement settings with the least process impacts and reliable accuracies. Using the quality metric, a calibration method, Archer self-calibration, is then used to remove the inaccuracies. Accuracy validation can be achieved by correlation to reference overlay data from another independent metrology source such as critical dimension–scanning electron microscopy data collected on a device correlated metrology hybrid target or by electrical testing. Additionally, reference metrology can also be used to verify which measurement conditions are the most accurate. We provide an example of such a case.
CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.
Citation Download Citation
Wei Jhe Tzai, Simon C. C. Hsu, Howard Chen, Charlie Chen, Yuan Chi Pai, Chun-Chi Yu, Chia-Ching Lin, Tal Itzkovich, Lipkong Yap, Eran Amit, David Tien, Eros Huang, Kelly T. L. Kuo, and Nuriel Amir "Techniques for improving overlay accuracy by using device correlated metrology targets as reference," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(4), 041412 (2 December 2014). https://doi.org/10.1117/1.JMM.13.4.041412
Published: 2 December 2014
JOURNAL ARTICLE
 6 PAGES
DOWNLOAD PAPER SAVE TO MY LIBRARY
GET CITATION
Lens.org Logo
CITATIONS
Cited by 7 scholarly publications and 2 patents.
Advertisement
Advertisement
KEYWORDS
Metrology
Overlay metrology
Calibration
Optical filters
Etching
Semiconducting wafers
Detection and tracking algorithms
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top