16 December 2014 Characterizing acid diffusion lengths in chemically amplified resists from measurements of deprotection kinetics
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Abstract
The acid-catalyzed deprotection of glassy poly(4-hydroxystyrene-co-
© 2014 Society of Photo-Optical Instrumentation Engineers (SPIE)
Abhijit A. Patil, Yogendra Narayan Pandey, Manolis Doxastakis, Gila E. Stein, "Characterizing acid diffusion lengths in chemically amplified resists from measurements of deprotection kinetics," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(4), 043017 (16 December 2014). https://doi.org/10.1117/1.JMM.13.4.043017 . Submission:
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