16 December 2014 Characterizing acid diffusion lengths in chemically amplified resists from measurements of deprotection kinetics
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Abstract
The acid-catalyzed deprotection of glassy poly(4-hydroxystyrene-co-
© 2014 Society of Photo-Optical Instrumentation Engineers (SPIE)
Abhijit A. Patil, Abhijit A. Patil, Yogendra Narayan Pandey, Yogendra Narayan Pandey, Manolis Doxastakis, Manolis Doxastakis, Gila E. Stein, Gila E. Stein, } "Characterizing acid diffusion lengths in chemically amplified resists from measurements of deprotection kinetics," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(4), 043017 (16 December 2014). https://doi.org/10.1117/1.JMM.13.4.043017 . Submission:
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