30 December 2014 Exploiting sub-20-nm complementary metal-oxide semiconductor technology challenges to design affordable systems-on-chip
Author Affiliations +
Abstract
For the past four decades, cost and features have driven complementary metal-oxide semiconductor (CMOS) scaling. Severe lithography and material limitations seen below the 20-nm node, however, are challenging the fundamental premise of affordable CMOS scaling. Just continuing to co-optimize leaf cell circuit and layout designs with process technology does not enable us to exploit the challenges of sub-20-nm CMOS. For affordable scaling, it is imperative to work past sub-20-nm technology impediments while exploiting its features. To this end, we propose to broaden the scope of design technology co-optimization (DTCO) to be more holistic by including microarchitecture design and computer-aided design, along with circuits, layout, and process technology. Furthermore, we undertook such a holistic DTCO for all critical design elements such as embedded memory, standard cell logic, analog components, and physical synthesis in a 14-nm process. Measurements results from experimental designs in a representative 14-nm process from IBM demonstrate the efficacy of the proposed approach.
© 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)
Kaushik Vaidyanathan, Kaushik Vaidyanathan, Qiuling Zhu, Qiuling Zhu, Lars Liebmann, Lars Liebmann, Kafai Lai, Kafai Lai, Stephen Wu, Stephen Wu, Renzhi Liu, Renzhi Liu, Yandong Liu, Yandong Liu, Andzrej Strojwas, Andzrej Strojwas, Larry Pileggi, Larry Pileggi, } "Exploiting sub-20-nm complementary metal-oxide semiconductor technology challenges to design affordable systems-on-chip," Journal of Micro/Nanolithography, MEMS, and MOEMS 14(1), 011007 (30 December 2014). https://doi.org/10.1117/1.JMM.14.1.011007 . Submission:
JOURNAL ARTICLE
17 PAGES


SHARE
RELATED CONTENT

Foundry technology trend
Proceedings of SPIE (August 26 1998)
Foundry technology trend
Proceedings of SPIE (August 27 1998)
Foundry technology trend
Proceedings of SPIE (September 03 1998)
Foundry technology trend
Proceedings of SPIE (September 03 1998)
Foundry technology trend
Proceedings of SPIE (September 02 1998)

Back to Top