9 February 2015 Magnetic debris mitigation system for extreme ultraviolet sources
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In extreme ultraviolet (EUV) lithography, plasmas are used to generate EUV light. Unfortunately, these plasmas expel high-energy ions and neutrals which damage the collector optic used to collect and focus the EUV light. One of the main problems facing EUV source manufacturers is the necessity to mitigate this debris. A magnetic mitigation system to deflect ionic debris by use of a strong permanent magnet is proposed and investigated. A detailed computational model of magnetic mitigation is presented, and experimental results from an EUV source confirm both the correctness of the model and the viability of magnetic mitigation as a successful means of deflecting ionic debris.
© 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)
Daniel T. Elg, John R. Sporre, Davide Curreli, Ivan A. Shchelkanov, David N. Ruzic, Karl R. Umstadter, "Magnetic debris mitigation system for extreme ultraviolet sources," Journal of Micro/Nanolithography, MEMS, and MOEMS 14(1), 013506 (9 February 2015). https://doi.org/10.1117/1.JMM.14.1.013506 . Submission:


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