10 April 2015 Patterning critical dimension control for advanced logic nodes
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Patterning process control has undergone major evolutions over the last few years. Critical dimension, focus, and overlay control require deep insight into process-variability understanding to be properly apprehended. Process setup is a complex engineering challenge. In the era of mid k1 lithography (<0.6), process windows were quite comfortable with respect to tool capabilities, therefore, some sources of variability were, if not ignored, at least considered as negligible. The low k1 patterning (<0.4) era has broken down this concept. For the most advanced nodes, engineers need to consider such a wide set of information that holistic processing is often mentioned as the way to handle the setup of the process and its variability. The main difficulty is to break down process-variability sources in detail and be aware that what could have been formerly negligible has become a very significant contributor requiring control down to a fraction of a nanometer. The scope of this article is to highlight that today, engineers have to zoom deeper into variability. Even though process tools have greatly improved their capabilities, diminishing process windows require more than tool-intrinsic optimization. Process control and variability compensations are major contributors to success. Some examples will be used to explain how complex the situation is and how interlinked processes are today.
© 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)
Bertrand Le-Gratiet, Bertrand Le-Gratiet, Jean De-Caunes, Jean De-Caunes, Maxime Gatefait, Maxime Gatefait, Auguste Lam, Auguste Lam, Alain Ostrovsky, Alain Ostrovsky, Jonathan Planchot, Jonathan Planchot, Vincent Farys, Vincent Farys, Julien Ducoté, Julien Ducoté, Marc Mikolajczak, Marc Mikolajczak, Vincent Morin, Vincent Morin, Nicolas Chojnowski, Nicolas Chojnowski, Frank Sundermann, Frank Sundermann, Alice Pelletier, Alice Pelletier, Regis Bouyssou, Regis Bouyssou, Cedric Monget, Cedric Monget, Jean-Damien Chapon, Jean-Damien Chapon, Bastien Orlando, Bastien Orlando, Laurene Babaud, Laurene Babaud, Céline Lapeyre, Céline Lapeyre, Emek Yesilada, Emek Yesilada, Anna Szucs, Anna Szucs, Jean-Christophe Michel, Jean-Christophe Michel, Latifa Desvoivres, Latifa Desvoivres, Onintza Ros Bengoechea, Onintza Ros Bengoechea, Pascal Gouraud, Pascal Gouraud, } "Patterning critical dimension control for advanced logic nodes," Journal of Micro/Nanolithography, MEMS, and MOEMS 14(2), 021103 (10 April 2015). https://doi.org/10.1117/1.JMM.14.2.021103 . Submission:

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