7 August 2015 Step-and-repeat nanoimprint on pre-spin coated film for the fabrication of integrated optical devices
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Abstract
A step-and-repeat nanoimprint lithography (SR-NIL) process on a pre-spin-coated film is employed for the fabrication of an integrated optical device for on-chip spectroscopy. The complex device geometry has a footprint of about 3  cm2 and comprises several integrated optical components with different pattern size and density. Here, a new resist formulation for SR-NIL was tested for the first time and proved effective at dramatically reducing the occurrence of systematic defects due to film dewetting, trapped bubbles, and resist peel-off. A batch of 180 dies were imprinted, and statistics on the imprint success rate is discussed. Devices were optically characterized and benchmarked to an identical chip that was fabricated by electron-beam lithography. The overall performance of the imprinted nanospectrometers is well-aligned with that of the reference chip, which demonstrates the great potential of our SR-NIL for the low-cost manufacturing of integrated optical devices.
© 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)
Giuseppe Calafiore, Giuseppe Calafiore, Alexander Koshelev, Alexander Koshelev, Alexander Goltsov, Alexander Goltsov, Scott D. Dhuey, Scott D. Dhuey, Simone Sassolini, Simone Sassolini, Martin Messerschmidt, Martin Messerschmidt, Vladimir Yankov, Vladimir Yankov, Arne Schleunitz, Arne Schleunitz, Carlos A. Piña-Hernandez, Carlos A. Piña-Hernandez, Fabrizio Candido Pirri, Fabrizio Candido Pirri, Stefano Cabrini, Stefano Cabrini, Christophe Peroz, Christophe Peroz, } "Step-and-repeat nanoimprint on pre-spin coated film for the fabrication of integrated optical devices," Journal of Micro/Nanolithography, MEMS, and MOEMS 14(3), 033506 (7 August 2015). https://doi.org/10.1117/1.JMM.14.3.033506 . Submission:
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