14 October 2015 Organometallic carboxylate resists for extreme ultraviolet with high sensitivity
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Abstract
We have developed organometallic carboxylate compounds [RnM(O2CR′)2] capable of acting as negative-tone extreme ultraviolet (EUV) resists. The most sensitive of these resists contain antimony, three R-groups and two carboxylate groups, and carboxylate groups with polymerizable olefins (e.g., acrylate, methacrylate, or styrenecarboxylate). Evidence suggests that high sensitivity is achieved through the polymerization of olefins in the exposed region. We have performed a systematic sensitivity study of the molecules of the type RnM(O2CR′)2 where we have studied seven R groups, four main group metals (M), and three polymerizable carboxylate groups (O2CR′). The sensitivity of these resists was evaluated using Emax or dose to maximum resist thickness after exposure and development. We found that the greatest predictor of sensitivity of the RnSb(O2CR′)2 resists is their level of polymerizable olefins. We mathematically define the polymerizable olefin loading (POL) as the ratio of the number of olefins versus the number of nonhydrogen atoms. Linear and log plots of Emax versus POL for a variety of molecules of the type R3Sb(O2CR′)2 lend insight into the behavior of these resists.
© 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)
James Passarelli, James Passarelli, Michael Murphy, Michael Murphy, Ryan Del Re, Ryan Del Re, Miriam M. Sortland, Miriam M. Sortland, Jodi Hotalen, Jodi Hotalen, Levi Dousharm, Levi Dousharm, Roberto Fallica, Roberto Fallica, Yasin Ekinci, Yasin Ekinci, Mark Neisser, Mark Neisser, Daniel A. Freedman, Daniel A. Freedman, Robert L. Brainard, Robert L. Brainard, } "Organometallic carboxylate resists for extreme ultraviolet with high sensitivity," Journal of Micro/Nanolithography, MEMS, and MOEMS 14(4), 043503 (14 October 2015). https://doi.org/10.1117/1.JMM.14.4.043503 . Submission:
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