Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks

Takeshi Isogawa; Kazunori Seki; Mark Lawliss; Zhengqing J. Qi; Jed H. Rankin; Shinji Akima

doi:10.1117/1.JMM.15.2.021010

18 March 2016 Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks

Takeshi Isogawa, Kazunori Seki, Mark Lawliss, Zhengqing J. Qi, Jed H. Rankin, Shinji Akima

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 15, Issue 2, 021010 (March 2016). https://doi.org/10.1117/1.JMM.15.2.021010

Abstract

A variety of repairs were conducted on extreme ultraviolet (EUV) multilayer, including protection against pattern degradation in manufactural use, in order to evaluate feasibility of multilayer repair and subsequent protection schemes. The efficacy of postrepair protection techniques is evaluated to determine the lifetime of multilayer repairs. Simulations were used to select the optimal material thicknesses for repair protection, and the simulation results are verified with the lithographic results. The results showed a high correlation coefficient. Finally, all repaired sites were cleaned multiple times to quantify repair durability and impact on wafer critical dimension (CD). Aerial imaging of the repair sites before and after cleans showed a dramatic degradation of wafer CD. However, we show that applying a surface protection material after multilayer repair successfully mitigates the influence of multilayer degradation during extensive manufacturing operations.

Citation Download Citation

Takeshi Isogawa, Kazunori Seki, Mark Lawliss, Zhengqing J. Qi, Jed H. Rankin, and Shinji Akima "Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks," Journal of Micro/Nanolithography, MEMS, and MOEMS 15(2), 021010 (18 March 2016). https://doi.org/10.1117/1.JMM.15.2.021010

Published: 18 March 2016

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