5 February 2016 Development of nanoimprint lithography templates toward high-volume manufacturing
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Abstract
Development of nanoimprint lithography (NIL) templates is discussed. The template fabrication process and its performance are presented with consideration of the requirements of NIL for high-volume manufacturing. Defectivity, image placement, and critical dimension uniformity are the three major performance parameters of the templates, and their current status is shown.
© 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
Koji Ichimura, Koji Ichimura, Kouji Yoshida, Kouji Yoshida, Saburo Harada, Saburo Harada, Takaharu Nagai, Takaharu Nagai, Masaaki Kurihara, Masaaki Kurihara, Naoya Hayashi, Naoya Hayashi, } "Development of nanoimprint lithography templates toward high-volume manufacturing," Journal of Micro/Nanolithography, MEMS, and MOEMS 15(2), 021006 (5 February 2016). https://doi.org/10.1117/1.JMM.15.2.021006 . Submission:
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