29 September 2016 Directed self-assembly compliant flow with immersion lithography: from material to design and patterning
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Abstract
We present a directed self-assembly (DSA) compliant flow for contact/via layers with immersion lithography assuming the graphoepitaxy process for the cylinders’ formation. We demonstrate that the DSA technology enablement needs co-optimization among material, design, and lithography. We show that the number of DSA grouping constructs is countable for the gridded-design architecture. We use template error enhancement factor to choose DSA material, determine grouping design rules, and select the optimum guiding patterns. Our post-pxOPC imaging data show that it is promising to achieve two-mask solution with DSA for the contact/via layer using 193i at 5 nm node.
© 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
Yuansheng Ma, Yan Wang, James Word, Junjiang Lei, Joydeep Mitra, Juan Andres Torres, Le Hong, Germain L. Fenger, Daman Khaira, Moshe E. Preil, Jongwook Kye, Harry J. Levinson, "Directed self-assembly compliant flow with immersion lithography: from material to design and patterning," Journal of Micro/Nanolithography, MEMS, and MOEMS 15(3), 031610 (29 September 2016). https://doi.org/10.1117/1.JMM.15.3.031610 . Submission:
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