Dual brush process for selective surface modification in graphoepitaxy directed self-assembly

Jan Doise; Boon Teik Chan; Masafumi Hori; Roel Gronheid

doi:10.1117/1.JMM.16.3.033503

21 August 2017 Dual brush process for selective surface modification in graphoepitaxy directed self-assembly

Jan Doise, Boon Teik Chan, Masafumi Hori, Roel Gronheid

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 16, Issue 3, 033503 (August 2017). https://doi.org/10.1117/1.JMM.16.3.033503

Abstract

Graphoepitaxy directed self-assembly is a potential low-cost solution for patterning via layers with pitches beyond the reach of a single optical lithographic exposure. In this process, selective control of the interfacial energy at the bottom and sidewall of the template is an important but challenging exercise. A dual brush process is implemented, in which two brushes with distinct end-groups are consecutively grafted to the prepattern to achieve fully independent modification of the bottom and sidewall surface of the template. A comprehensive study of hole pattern quality shows that using a dual brush process leads to a substantial improvement in terms of positional and dimensional variability across the process window. These findings will be useful to others who wish to manipulate polymer–surface interactions in directed self-assembly flows.

Citation Download Citation

Jan Doise, Boon Teik Chan, Masafumi Hori, and Roel Gronheid "Dual brush process for selective surface modification in graphoepitaxy directed self-assembly," Journal of Micro/Nanolithography, MEMS, and MOEMS 16(3), 033503 (21 August 2017). https://doi.org/10.1117/1.JMM.16.3.033503

Received: 27 April 2017; Accepted: 28 July 2017; Published: 21 August 2017

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