19 September 2017 PatterNet: a system to learn compact physical design pattern representations for pattern-based analytics
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This research considers the problem of generating compact vector representations of physical design patterns for analytics purposes in semiconductor patterning domain. PatterNet uses a deep artificial neural network to learn mapping of physical design patterns to a compact Euclidean hyperspace. Distances among mapped patterns in this space correspond to dissimilarities among patterns defined at the time of the network training. Once the mapping network has been trained, PatterNet embeddings can be used as feature vectors with standard machine learning algorithms, and pattern search, comparison, and clustering become trivial problems. PatterNet is inspired by the concepts developed within the framework of generative adversarial networks as well as the FaceNet. Our method facilitates a deep neural network (DNN) to learn directly the compact representation by supplying it with pairs of design patterns and dissimilarity among these patterns defined by a user. In the simplest case, the dissimilarity is represented by an area of the XOR of two patterns. Important to realize that our PatterNet approach is very different to the methods developed for deep learning on image data. In contrast to “conventional” pictures, the patterns in the CAD world are the lists of polygon vertex coordinates. The method solely relies on the promise of deep learning to discover internal structure of the incoming data and learn its hierarchical representations. Artificial intelligence arising from the combination of PatterNet and clustering analysis very precisely follows intuition of patterning/optical proximity correction experts paving the way toward human-like and human-friendly engineering tools.
© 2017 Society of Photo-Optical Instrumentation Engineers (SPIE)
Andrey A. Lutich, Andrey A. Lutich, } "PatterNet: a system to learn compact physical design pattern representations for pattern-based analytics," Journal of Micro/Nanolithography, MEMS, and MOEMS 16(3), 034505 (19 September 2017). https://doi.org/10.1117/1.JMM.16.3.034505 . Submission: Received: 16 June 2017; Accepted: 23 August 2017
Received: 16 June 2017; Accepted: 23 August 2017; Published: 19 September 2017

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