Special Section Guest Editorial: EUV Lithography for the 3-nm Node and Beyond

Vivek Bakshi; Hakaru Mizoguchi; Ted Liang; Andrew Grenville; Jos P. Benschop

doi:10.1117/1.JMM.16.4.041001

27 December 2017 Special Section Guest Editorial: EUV Lithography for the 3-nm Node and Beyond

Vivek Bakshi, Hakaru Mizoguchi, Ted Liang, Andrew Grenville, Jos P. Benschop

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 16, Issue 4, 041001 (December 2017). https://doi.org/10.1117/1.JMM.16.4.041001

Abstract

This guest editorial introduces and summarizes the Special Section on EUV Lithography for the 3-nm Node and Beyond

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Vivek Bakshi, Hakaru Mizoguchi, Ted Liang, Andrew Grenville, and Jos P. Benschop "Special Section Guest Editorial: EUV Lithography for the 3-nm Node and Beyond," Journal of Micro/Nanolithography, MEMS, and MOEMS 16(4), 041001 (27 December 2017). https://doi.org/10.1117/1.JMM.16.4.041001

Published: 27 December 2017

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