23 March 2018 Model-based guiding pattern synthesis for robust assembly of contact layers using directed self-assembly
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J. of Micro/Nanolithography, MEMS, and MOEMS, 17(1), 013508 (2018). doi:10.1117/1.JMM.17.1.013508
Abstract
Directed self-assembly (DSA) has emerged as one of the most compelling next-generation patterning techniques for sub 7 nm via or contact layers. A key issue in enabling DSA as a mainstream patterning technique is the generation of grapho-epitaxy-based guiding pattern (GP) shapes to assemble the contact patterns on target with high fidelity and resolution. Current GP generation is mostly empirical, and limited to a very small number of via configurations. We propose the first model-based GP synthesis algorithm and methodology for on-target and robust DSA, on general via pattern configurations. The final postoptical proximity correction-printed GPs derived from our original synthesized GPs are resilient to process variations and continue to maintain the same DSA fidelity in terms of placement error and target shape.
© 2018 Society of Photo-Optical Instrumentation Engineers (SPIE)
Joydeep Mitra, Andres Torres, Yuansheng Ma, David Z. Pan, "Model-based guiding pattern synthesis for robust assembly of contact layers using directed self-assembly," Journal of Micro/Nanolithography, MEMS, and MOEMS 17(1), 013508 (23 March 2018). https://doi.org/10.1117/1.JMM.17.1.013508 Submission: Received 18 December 2017; Accepted 6 March 2018
Submission: Received 18 December 2017; Accepted 6 March 2018
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