Recent advances in 3- to 10-nm quantum optical lithography

Eugen Pavel; Gabriel Prodan; Virgil Marinescu; Roxana Trusca

doi:10.1117/1.JMM.18.2.020501

Translator Disclaimer

7 May 2019 Recent advances in 3- to 10-nm quantum optical lithography

Eugen Pavel, Gabriel Prodan, Virgil Marinescu, Roxana Trusca

Author Affiliations +

J. of Micro/Nanolithography, MEMS, and MOEMS, 18(2), 020501 (2019). https://doi.org/10.1117/1.JMM.18.2.020501

Abstract

Development of semiconductor technologies requires innovative approaches. Optical lithography, as a key element in this process, needs to be extended into the sub-10 nm range. Manipulation of matter in this range, in order to produce complex patterns, is a challenge for lithographic techniques. A diffraction-unlimited method (quantum optical lithography) for nanofabrication is detailed with applications in prototyping functional nanostructures. The writing method was applied to two different materials: resist and fluorescent glass–ceramics. Complex patterns (rectangles, triangles, and letters) with 3-nm linewidth were obtained on Si₃N₄ transmission electron microscopy grids covered by the resist.

Citation Download Citation

Eugen Pavel, Gabriel Prodan, Virgil Marinescu, and Roxana Trusca "Recent advances in 3- to 10-nm quantum optical lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 18(2), 020501 (7 May 2019). https://doi.org/10.1117/1.JMM.18.2.020501

Received: 21 February 2019; Accepted: 12 April 2019; Published: 7 May 2019

ACCESS THE FULL ARTICLE