Recent advances in 3- to 10-nm quantum optical lithography

Eugen Pavel; Gabriel Prodan; Virgil Marinescu; Roxana Trusca

doi:10.1117/1.JMM.18.2.020501

Translator Disclaimer

7 May 2019 Recent advances in 3- to 10-nm quantum optical lithography

Eugen Pavel; Gabriel Prodan; Virgil Marinescu; Roxana Trusca

Author Affiliations +

J. of Micro/Nanolithography, MEMS, and MOEMS, 18(2), 020501 (2019). https://doi.org/10.1117/1.JMM.18.2.020501

Abstract

Development of semiconductor technologies requires innovative approaches. Optical lithography, as a key element in this process, needs to be extended into the sub-10 nm range. Manipulation of matter in this range, in order to produce complex patterns, is a challenge for lithographic techniques. A diffraction-unlimited method (quantum optical lithography) for nanofabrication is detailed with applications in prototyping functional nanostructures. The writing method was applied to two different materials: resist and fluorescent glass–ceramics. Complex patterns (rectangles, triangles, and letters) with 3-nm linewidth were obtained on Si₃N₄ transmission electron microscopy grids covered by the resist.

Citation Download Citation

Eugen Pavel, Gabriel Prodan, Virgil Marinescu, and Roxana Trusca "Recent advances in 3- to 10-nm quantum optical lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 18(2), 020501 (7 May 2019). https://doi.org/10.1117/1.JMM.18.2.020501

Received: 21 February 2019; Accepted: 12 April 2019; Published: 7 May 2019

JOURNAL ARTICLE
3 PAGES

DOWNLOAD PDF SAVE TO MY LIBRARY

SHARE

GET CITATION

< Previous Article

|

Next Article >

KEYWORDS

Optical lithography

Transmission electron microscopy

Scanning electron microscopy

Silicon

Lithography

Nanostructures

Prototyping

Show All Keywords

RELATED CONTENT

Hybrid materials: a bottom-up approach for nanotechnology applications
Proceedings of SPIE (September 10 2014)

Nanoimprint of large area optical gratings on a conventional photoresist...
Proceedings of SPIE (March 14 2016)

Directed self assembly of Si containing and topcoat free block...
Proceedings of SPIE (April 01 2016)

Reactive ion etching challenges for half pitch sub 10 nm...
Proceedings of SPIE (March 23 2016)

1.5nm fabrication of test patterns for characterization of metrological systems
Proceedings of SPIE (March 28 2017)

Dots-on-the-fly electron beam lithography
Proceedings of SPIE (March 22 2016)

ZnO nanoparticles obtained by hydrothermal method at low temperature
Proceedings of SPIE (September 09 2008)

Subscribe to Digital Library

Receive Erratum Email Alert

Show All Keywords

Keywords/Phrases

Search In:

Publication Years