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7 January 2020 Fabrication of polymeric photonic structures using dip-pen nanolithography
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Abstract

Dip-pen nanolithography (DPN) is a low-cost, versatile, bench-top technology for direct patterning of materials over surfaces. Our study reports on the production of two-dimensional optical grating nanostructures based on polymers, using DPN. The influence of both the ink composition and the dwell time were investigated. Prototypes of phase masks were manufactured, and their main characteristics were analyzed. The results in our work may contribute to improving the fabrication process of optical structures, including the production of microlenses with controlled focal length.

© 2020 Society of Photo-Optical Instrumentation Engineers (SPIE) 1932-5150/2020/$28.00 © 2020 SPIE
Zeev Fradkin, Marcos Roitman, Amos Bardea, Roy Avrahamy, Yeoshua Bery, Hanan Ohana, and Moshe Zohar "Fabrication of polymeric photonic structures using dip-pen nanolithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 19(1), 013501 (7 January 2020). https://doi.org/10.1117/1.JMM.19.1.013501
Received: 26 May 2019; Accepted: 10 December 2019; Published: 7 January 2020
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