1 January 2003 Large-field particle beam optics for projection and proximity printing and for maskless lithography
Author Affiliations +
Abstract
Recent studies have shown the utility of ion projection lithography (IPL) for the manufacturing of integrated circuits. In addition, ion projection direct structuring (IPDS) can be used for resistless, noncontact modification of materials. In cooperation with IBM Storage Technology Division, ion projection patterning of magnetic media layers has been demonstrated. With masked ion beam proximity techniques, unique capabilities for lithography on nonplanar (curved) surfaces are outlined. Designs are presented for a masked ion beam proximity lithography (MIBL) and masked ion beam direct structuring (MIBS) tool with sub-20-nm resolution capability within 88-mm exposure fields. The possibility of extremely high reduction ratios (200:1) for high-volume projection maskless lithography (projection-ML2) is discussed. In the case of projection-ML2 there are advantages of using electrons instead of ions. Including gray scaling, an improved concept for a ≤50-nm projection-ML2 system is presented with the potential to meet a throughput of 20 wafers per hour (300 mm).
© (2003) Society of Photo-Optical Instrumentation Engineers (SPIE)
Hans Loeschner, Hans Loeschner, Gerhard Stengl, Gerhard Stengl, Herbert Buschbeck, Herbert Buschbeck, A. Chalupka, A. Chalupka, Gertraud Lammer, Gertraud Lammer, Elmar Platzgummer, Elmar Platzgummer, Herbert Vonach, Herbert Vonach, Patrick W.H. de Jager, Patrick W.H. de Jager, Rainer Kaesmaier, Rainer Kaesmaier, Albrecht Ehrmann, Albrecht Ehrmann, Stefan Hirscher, Stefan Hirscher, Andreas Wolter, Andreas Wolter, Andreas Dietzel, Andreas Dietzel, Ruediger Berger, Ruediger Berger, Hubert Grimm, Hubert Grimm, Bruce D. Terris, Bruce D. Terris, Wilhelm H. Bruenger, Wilhelm H. Bruenger, Gerhard Gross, Gerhard Gross, Olaf K. Fortagne, Olaf K. Fortagne, Dieter Adam, Dieter Adam, Michael Boehm, Michael Boehm, Hans Eichhorn, Hans Eichhorn, Reinhard Springer, Reinhard Springer, Joerg Butschke, Joerg Butschke, Florian Letzkus, Florian Letzkus, Paul Ruchhoeft, Paul Ruchhoeft, John Charles Wolfe, John Charles Wolfe, } "Large-field particle beam optics for projection and proximity printing and for maskless lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 2(1), (1 January 2003). https://doi.org/10.1117/1.1528946 . Submission:
JOURNAL ARTICLE
15 PAGES


SHARE
RELATED CONTENT

Focused Ion Beam Microfabrication
Proceedings of SPIE (June 14 1988)
Dry Etching With Ion Beam Milling
Proceedings of SPIE (July 17 1979)
Advanced FIB mask repair technology for ArF lithography: II
Proceedings of SPIE (January 22 2001)
Current Status Of Ion Projection Lithography
Proceedings of SPIE (June 20 1985)

Back to Top