Liquid immersion lithography using water as an immersion liquid: role of orientation contributions to light scattering at 193 nm

Martin Letz; Konrad Knapp

doi:10.1117/1.1794179

1 October 2004 Liquid immersion lithography using water as an immersion liquid: role of orientation contributions to light scattering at 193 nm

Martin Letz, Konrad Knapp

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 3, Issue 4, (October 2004). https://doi.org/10.1117/1.1794179

Abstract

The orientation and center-of-mass contributions of water to light scattering are calculated based on the known anisotropy of the polarizability of the water molecule. Further, the polarization ratio under 90-deg scattering is calculated and the relation between orientational and center-off-mass contributions for different polarization directions is evaluated. An experiment is proposed that enables us to separate the different scattering contributions. While the amount of scattering due to molecular orientations seems to be still moderate for water, it is expected to be larger for most fluids, like fluorinated polymers.

©(2004) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Martin Letz and Konrad Knapp "Liquid immersion lithography using water as an immersion liquid: role of orientation contributions to light scattering at 193 nm," Journal of Micro/Nanolithography, MEMS, and MOEMS 3(4), (1 October 2004). https://doi.org/10.1117/1.1794179

Published: 1 October 2004

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