1 April 2004 Glass cutting by femtosecond pulsed irradiation
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Abstract
We report on quartz and glass cutting by a lateral scanning of femtosecond pulses (150 fs at 1 kHz repetition rate) of 800 nm wavelength at room and low pressure (5 Torr) air ambience. Pulses were focused by a low numerical aperture (NA≤0.1) objective lens. Optimization of fabrication conditions: pulse energy and scanning speed were carried out to achieve large-scale (millimeter-to-centimeter) cutting free of microcracks of submicron dimensions along the edges and walls of the cut. Cutting through out the samples of 0.1-0.5 mm thickness was successfully achieved without apparent heat affected zone. At low air pressure (5 Torr) ambience, redeposition of ablated material was considerably reduced. It is demonstrated that the damage on the rear surface was induced by the stress waves, which originated from the plasma ablation pressure pulse. The mechanism of femtosecond-laser cutting of transparent materials at high irradiance and the influence of stress waves generated by plasma plume are discussed.
© (2004) Society of Photo-Optical Instrumentation Engineers (SPIE)
Egidijus Vanagas, Jouji Kawai, Dmitry Tuzhilin, Igor Kudryashov, Atsushi Mizuyama, Kazutaka G. Nakamura, Ken-ichi Kondo, Shin-ya Koshihara, Masaki Takesada, Kazunari Matsuda, Saulius Juodkazis, Vygandas Jarutis, Shigeki Matsuo, Hiroaki Misawa, "Glass cutting by femtosecond pulsed irradiation," Journal of Micro/Nanolithography, MEMS, and MOEMS 3(2), (1 April 2004). https://doi.org/10.1117/1.1668274 . Submission:
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