1 October 2004 Electron beam mastering process realized over a 100-GB/layer capacity disk
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Abstract
We demonstrate the capability of 100-GB density recording by electron beam mastering and readout by a near-field optical pickup with an effective NA of 2.05 and a blue LD of 405-nm wavelength. A silicon (Si) disk of 100-GB density is fabricated by an optimized Si etching process condition to form suitable pit pattern shapes for the near-field readout.
© (2004) Society of Photo-Optical Instrumentation Engineers (SPIE)
Minoru Takeda, Minoru Takeda, Motohiro Furuki, Motohiro Furuki, Masanobu Yamamoto, Masanobu Yamamoto, Masataka Shinoda, Masataka Shinoda, Kimihiro Saito, Kimihiro Saito, Yuichi Aki, Yuichi Aki, Hiroshi Kawase, Hiroshi Kawase, Mitsuru Koizumi, Mitsuru Koizumi, Toshiaki Miyokawa, Toshiaki Miyokawa, Masao Mutou, Masao Mutou, } "Electron beam mastering process realized over a 100-GB/layer capacity disk," Journal of Micro/Nanolithography, MEMS, and MOEMS 3(4), (1 October 2004). https://doi.org/10.1117/1.1793154 . Submission:
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