1 October 2004 Electron beam mastering process realized over a 100-GB/layer capacity disk
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Abstract
We demonstrate the capability of 100-GB density recording by electron beam mastering and readout by a near-field optical pickup with an effective NA of 2.05 and a blue LD of 405-nm wavelength. A silicon (Si) disk of 100-GB density is fabricated by an optimized Si etching process condition to form suitable pit pattern shapes for the near-field readout.
Minoru Takeda, Motohiro Furuki, Masanobu Yamamoto, Masataka Shinoda, Kimihiro Saito, Yuichi Aki, Hiroshi Kawase, Mitsuru Koizumi, Toshiaki Miyokawa, Masao Mutou, "Electron beam mastering process realized over a 100-GB/layer capacity disk," Journal of Micro/Nanolithography, MEMS, and MOEMS 3(4), (1 October 2004). http://dx.doi.org/10.1117/1.1793154
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KEYWORDS
Silicon

Electron beams

Etching

Eye

Near field

Near field optics

Signal processing

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