1 April 2005 Mathematical model for the surface relief formation of photographic emulsions
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J. of Micro/Nanolithography, MEMS, and MOEMS, 4(2), 023010 (2005). doi:10.1117/1.1897385
Abstract
We present a mathematical model of the surface relief formation suffered by photographic emulsions when an intensity pattern is recorded. Traditional explanations consider that this relief is due to silver compounds, but mainly to a mass transfer process in presence of tension forces. According to this description, the model considers diffusion and smoothing processes. Main parameters of the model were obtained by fitting simulated profiles to measured profiles for different micro-optical elements. The error between simulated and measured profiles ranged from 2.6% to 7.3%. Results obtained with this model reinforce the hypothesis of the surface relief formation. This model may be useful in numerical simulations of surface relief micro optical elements.
Enrique Navarrete-Garcia, Sergio Calixto-Carrera, "Mathematical model for the surface relief formation of photographic emulsions," Journal of Micro/Nanolithography, MEMS, and MOEMS 4(2), 023010 (1 April 2005). https://doi.org/10.1117/1.1897385
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