1 April 2005 Fabrication of silicon microring resonators with narrow coupling gaps
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J. of Micro/Nanolithography, MEMS, and MOEMS, 4(2), 023013 (2005). doi:10.1117/1.1898605
Abstract
We demonstrate fabrication of silicon microring resonators with narrow coupling gaps using electron-beam lithography followed by lift-off process. Microring resonators of different diameters and 58 nm coupling gaps are fabricated in a silicon-on-insulator water. These devices are then characterized using a tunable laser source. For the microring resonator with a diameter of 7.5 µm, the measured maximum transmission is 88%, the free spectra range is 25 nm, the finesse is 28, and the Q factor is 1715.
Binglin Miao, Peng Yao, Janusz A. Murakowski, Dennis W. Prather, "Fabrication of silicon microring resonators with narrow coupling gaps," Journal of Micro/Nanolithography, MEMS, and MOEMS 4(2), 023013 (1 April 2005). http://dx.doi.org/10.1117/1.1898605
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KEYWORDS
Microrings

Resonators

Silicon

Waveguides

Lithography

Chromium

Polymethylmethacrylate

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