1 July 2005 General model for estimating bubble dissolution and droplet evaporation times
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Abstract
Bubbles and droplets may be detrimental to the successful implementation of immersion lithography, depending in part on their lifetime in the system. In this work, a model is developed to estimate the dissolution times of nitrogen bubbles in pure water that may be free-floating or adhered to a solid surface. The model is then extended to small free and adhered droplets. Bubble dissolution and droplet evaporation times for typical immersion lithography conditions are presented.
© (2005) Society of Photo-Optical Instrumentation Engineers (SPIE)
Timothy A. Shedd, Timothy A. Shedd, } "General model for estimating bubble dissolution and droplet evaporation times," Journal of Micro/Nanolithography, MEMS, and MOEMS 4(3), 033004 (1 July 2005). https://doi.org/10.1117/1.2037427 . Submission:
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