1 July 2005 Short-wavelength ablation of molecular solids: pulse duration and wavelength effects
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Abstract
For conventional wavelength (UV-vis-IR) lasers delivering radiation energy to the surface of materials, ablation thresholds, ablation (etch) rates, and the quality of ablated structures often differ dramatically between short (typically nanosecond) and ultrashort (typically femtosecond) pulses. Various short-wavelength (λ<100 nm) lasers emitting pulses with durations ranging from ~10 fs to ~1 ns have recently been put into routine operation. This makes it possible to investigate how ablation characteristics depend on pulse duration in the XUV spectral region. Four sources of intense short-wavelength radiation available in the authors' laboratories, including XUV and soft x-ray lasers, are used for the ablation experiments. Based on the results of the experiments, the etch rates for three different pulse durations are compared using the XUV-ABLATOR code to compensate for the wavelength difference. Comparing the values of etch rates calculated for nanosecond pulses with those measured for shorter pulses, we can study the influence of pulse duration on XUV ablation efficiency. The results of the experiments also show that the ablation rate increases while the wavelength decreases from the XUV spectral region toward x-rays, mainly due to increase of attenuation lengths at short wavelengths.
Libor Juha, Michal Bittner, Dagmar Chvostova, Josef Krasa, Michaela Kozlov, Miroslav Pfeifer, Jiri Polan, Ansgar R. Präg, Bedrich Rus, Michal Stupka, Josef Feldhaus, Vit Letal, Zdenek Otcenasek, Jacek Krzywinski, Robert Nietubye, Jerzy B. Pelka, Andrzej Andrejczuk, Ryszard Sobierajski, Leszek Ryc, Frederick P. Boody, Henryk Fiedorowicz, Andrzej S. Bartnik, Janusz Mikolajczyk, Rafal Rakowski, Pavel Kubát, Ladislav Pína, Martin Horváth, Michael E. Grisham, Georgiy O. Vaschenko, Carmen S. Menoni, Jorge J. Rocca, "Short-wavelength ablation of molecular solids: pulse duration and wavelength effects," Journal of Micro/Nanolithography, MEMS, and MOEMS 4(3), 033007 (1 July 2005). https://doi.org/10.1117/1.2037467
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