1 October 2005 MOEMS-based lithography for the fabrication of micro-optical components
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Abstract
We present a new method for the fabrication of diffractive and refractive micro-optical components. The method is suitable for high-quality rapid prototyping of optical components and allows the fast experimental test of designs for computer-generated holograms or refractive microstructures. Our method is based on employing a digital-multimirror device (DMD) as a switchable projection mask. The DMD is imaged into a photoresist layer using a Carl Zeiss lithography objective with a demagnification of 10:1 and a numerical aperture of 0.32 on the image side. The resulting pixel size is 1.368×1.368 µm. In comparison with laser direct writing with a single spot, our method is a parallel processing of nearly 800,000 pixels (1024×768 pixels). This fabrication method can be applied to all MOEMS components. The method adds a new dimension in MOEMS processing, reducing the fabrication complexity, and improves the flexibility of process simulation and design.
© (2005) Society of Photo-Optical Instrumentation Engineers (SPIE)
Lars Erdmann, Lars Erdmann, Arnaud Deparnay, Arnaud Deparnay, Gunter Maschke, Gunter Maschke, Mario Längle, Mario Längle, Robert Brunner, Robert Brunner, } "MOEMS-based lithography for the fabrication of micro-optical components," Journal of Micro/Nanolithography, MEMS, and MOEMS 4(4), 041601 (1 October 2005). https://doi.org/10.1117/1.2114647 . Submission:
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