1 October 2005 High-performance microfabricated angular rate sensor
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The development of a miniature angular rate sensor based on silicon-on-insulator (SOI) microfabrication technology is presented. The design, fabrication, integration, and inertial testing of a MEMS-based angular rate sensor with large dynamic range were the driving forces behind this research. The design goals of 10-deg/h bias stability while operating through 2000-deg/s roll environments are presented. The sensor design is based on a straightforward single-mask fabrication approach that utilizes deep reactive ion etching of a 100-µm-thick device layer, with a buried 2- to 3-µm oxide layer used as the sacrificial layer, in an SOI substrate. To date, the data show demonstrated bias drift performance of 60 deg/h over this fast-roll environment.
© (2005) Society of Photo-Optical Instrumentation Engineers (SPIE)
Tracy Dean Hudson, Tracy Dean Hudson, Sherrie W. Holt, Sherrie W. Holt, Paul B. Ruffin, Paul B. Ruffin, Michael S. Kranz, Michael S. Kranz, James W. McKee, James W. McKee, Michael R. Whitley, Michael R. Whitley, Milan Buncick, Milan Buncick, Eric Tuck, Eric Tuck, } "High-performance microfabricated angular rate sensor," Journal of Micro/Nanolithography, MEMS, and MOEMS 4(4), 043006 (1 October 2005). https://doi.org/10.1117/1.2114787 . Submission:

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