1 July 2006 Concise formula for the Zernike coefficients of scaled pupils
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J. of Micro/Nanolithography, MEMS, and MOEMS, 5(3), 030501 (2006). doi:10.1117/1.2345672
Abstract
Modern steppers and scanners have a projection lens whose numerical aperture (NA) can be varied so as to optimize the image performance for certain lithographic features. Thus a variable fraction of the aberrations is actually involved in the imaging process. In this letter, we present a concise formula for the NA scaling of the Zernike coefficients. In addition, we apply our results to the Strehl ratio.
Augustus J.E.M. Janssen, Peter Dirksen, "Concise formula for the Zernike coefficients of scaled pupils," Journal of Micro/Nanolithography, MEMS, and MOEMS 5(3), 030501 (1 July 2006). http://dx.doi.org/10.1117/1.2345672
Submission: Received ; Accepted
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KEYWORDS
Lithography

Monochromatic aberrations

Zernike polynomials

Image processing

Scanners

Solids

Computer simulations

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