1 January 2006 Sustained polymer membranes fabricated by nanoimprint lithography
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Abstract
Perforated polymer membranes are fabricated using nanoimprint lithography and a sacrificial layer technique. The membranes with micrometer-sized pores are partially released from the substrate by locally dissolving the underlying layer. Thus, large arrays with interconnected pores can be fabricated. This process can be applied to a wide selection of polymeric materials, and has the potential to be extended to submicrostructures.
© (2006) Society of Photo-Optical Instrumentation Engineers (SPIE)
Helmut Schift, Helmut Schift, Sandro Bellini, Sandro Bellini, Uwe Pieles, Uwe Pieles, Jens Gobrecht, Jens Gobrecht, } "Sustained polymer membranes fabricated by nanoimprint lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 5(1), 011010 (1 January 2006). https://doi.org/10.1117/1.2172993 . Submission:
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