1 January 2006 Sustained polymer membranes fabricated by nanoimprint lithography
Author Affiliations +
J. of Micro/Nanolithography, MEMS, and MOEMS, 5(1), 011010 (2006). doi:10.1117/1.2172993
Abstract
Perforated polymer membranes are fabricated using nanoimprint lithography and a sacrificial layer technique. The membranes with micrometer-sized pores are partially released from the substrate by locally dissolving the underlying layer. Thus, large arrays with interconnected pores can be fabricated. This process can be applied to a wide selection of polymeric materials, and has the potential to be extended to submicrostructures.
Helmut Schift, Sandro Bellini, Uwe Pieles, Jens Gobrecht, "Sustained polymer membranes fabricated by nanoimprint lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 5(1), 011010 (1 January 2006). http://dx.doi.org/10.1117/1.2172993
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KEYWORDS
Polymers

Nanoimprint lithography

Nanolithography

Etching

Photomicroscopy

Microfluidics

Scanning electron microscopy

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