1 January 2006 Laser interference as a lithographic nanopatterning tool
Author Affiliations +
J. of Micro/Nanolithography, MEMS, and MOEMS, 5(1), 011012 (2006). doi:10.1117/1.2173269
Abstract
Laser interference lithography is reviewed as an adequate nanopatterning tool for devices with periodic structures. The structure size may practically be chosen in the range between 100 nm and 10.0 µm by adjusting the angle of incidence θ of the incoming laser beam. The exposure method is fast, inexpensive, and applicable for large areas. The method may be used to fabricate microsieves, shadow masks, calibration grids, and photonic crystals.
Cees J. M. van Rijn, "Laser interference as a lithographic nanopatterning tool," Journal of Micro/Nanolithography, MEMS, and MOEMS 5(1), 011012 (1 January 2006). http://dx.doi.org/10.1117/1.2173269
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KEYWORDS
Lithography

Chromium

Silicon

Nanostructures

Scanning electron microscopy

Mirrors

Photomasks

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