1 January 2006 Microzone plates with high-aspect ratio fabricated by e-beam and x-ray lithography
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J. of Micro/Nanolithography, MEMS, and MOEMS, 5(1), 013002 (2006). doi:10.1117/1.2170110
Abstract
We introduce a combined e-beam and x-ray lithographic method to fabricate microzone plates (MZP) on free-standing silicon nitride films. An automatic design program is developed to draw the complex layout of MZP with very smooth boundaries. A gold MZP master mask with a minimum ring width of 250 nm is fabricated by e-beam lithography. The master mask is replicated using x-ray lithography (XRL) and nickel electroplating to obtain the final MZP. The combined lithographic technique produces a MZP with a pattern aspect ratio of 4.4:1.
De-Qiang Wang, Leifeng Cao, Changqing Xie, Ming Liu, Tianchun Ye, "Microzone plates with high-aspect ratio fabricated by e-beam and x-ray lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 5(1), 013002 (1 January 2006). http://dx.doi.org/10.1117/1.2170110
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KEYWORDS
Electron beam lithography

X-ray lithography

Photomasks

Gold

Nickel

X-rays

Scanning electron microscopy

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