Oxidation resistance and microstructure of ruthenium-capped extreme ultraviolet lithography multilayers

Sasa Bajt; Zu Rong Dai; Erik J. Nelson; Mark A. Wall; Jennifer B. Alameda; Nhan Q. Nguyen; Sherry L. Baker; Jeffrey C. Robinson; John S. Taylor; Andrew L. Aquila; Nora V. Edwards

doi:10.1117/1.2201027

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1 April 2006 Oxidation resistance and microstructure of ruthenium-capped extreme ultraviolet lithography multilayers

Sasa Bajt; Zu Rong Dai; Erik J. Nelson; Mark A. Wall; Jennifer B. Alameda; Nhan Q. Nguyen; Sherry L. Baker; Jeffrey C. Robinson; John S. Taylor; Andrew L. Aquila; Nora V. Edwards

Author Affiliations +

Sasa Bajt,¹ Zu Rong Dai,¹ Erik J. Nelson,¹ Mark A. Wall,¹ Jennifer B. Alameda,¹ Nhan Q. Nguyen,¹ Sherry L. Baker,¹ Jeffrey C. Robinson,¹ John S. Taylor,¹ Andrew L. Aquila,² Nora V. Edwards³
¹Lawrence Livermore National Lab. (United States)
²Lawrence Berkeley National Lab. (United States)
³SEMATECH, Inc. (United States)

J. of Micro/Nanolithography, MEMS, and MOEMS, 5(2), 023004 (2006). https://doi.org/10.1117/1.2201027

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Abstract

The oxidation resistance of protective capping layers for extreme ultraviolet lithography (EUVL) multilayers depends on their microstructure. Differently prepared Ru-capping layers, deposited on Mo/Si EUVL multilayers, are investigated to establish their baseline structural, optical, and surface properties in an as-deposited state. The same capping layer structures are then tested for their thermal stability and oxidation resistance. The best performing Ru-capping layer structure is analyzed in detail with transmission electron microscopy (TEM). Compared to other Ru-capping layer preparations studied here, it is the only one that shows grains with preferential orientation. This information is essential to model and optimize the performance of EUVL multilayers.

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Sasa Bajt, Zu Rong Dai, Erik J. Nelson, Mark A. Wall, Jennifer B. Alameda, Nhan Q. Nguyen, Sherry L. Baker, Jeffrey C. Robinson, John S. Taylor, Andrew L. Aquila, and Nora V. Edwards "Oxidation resistance and microstructure of ruthenium-capped extreme ultraviolet lithography multilayers," Journal of Micro/Nanolithography, MEMS, and MOEMS 5(2), 023004 (1 April 2006). https://doi.org/10.1117/1.2201027

Published: 1 April 2006

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KEYWORDS

Ruthenium

Silicon

Oxidation

Molybdenum

Extreme ultraviolet lithography

Reflectivity

Electrons

Oxides

Resistance

Transmission electron microscopy

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Sasa Bajt, Zu Rong Dai, Erik J. Nelson, Mark A. Wall, Jennifer B. Alameda, Nhan Q. Nguyen, Sherry L. Baker, Jeffrey C. Robinson, John S. Taylor, Andrew L. Aquila, Nora V. Edwards, "Oxidation resistance and microstructure of ruthenium-capped extreme ultraviolet lithography multilayers," J. Micro/Nanolith. MEMS MOEMS 5(2) 023004 (1 April 2006)

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