1 April 2006 Two-dimensional periodic potential via multiple-beam interferometry for atom lithography
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J. of Micro/Nanolithography, MEMS, and MOEMS, 5(2), 023005 (2006). doi:10.1117/1.2201017
Abstract
We propose the use of square arrays of multiple atomic lenses, produced by interference of four nearly collinear optical beams in atom lithography using dipole force. Simulated lithographic patterns are reported for collimated as well as divergent rubidium atomic beam traveling in such square arrays of optical channels. The proposed configuration has the ability to write large numbers of periodic structures in square arrays in a single step.
Kamlesh Mukundrao Alti, Ardhendu Sekhar Patra, Alika Khare, "Two-dimensional periodic potential via multiple-beam interferometry for atom lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 5(2), 023005 (1 April 2006). http://dx.doi.org/10.1117/1.2201017
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KEYWORDS
Chemical species

Lithography

Rubidium

Collimation

Interferometry

Interferometers

Lenses

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