1 October 2006 Molecular ruler lithography using sacrificial host structures fabricated using electron beam lithography
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Abstract
Molecular ruler nanolithography combines conventional lithography techniques with chemical self-assembly methods to improve the resolution of the existing lithography tools. We demonstrate the implementation of molecular ruler nanolithography using sacrificial multilayer host structures defined by electron-beam lithography. Using this process, 40-nm metal features are produced using host features spaced 100 nm apart. Using a thicker sacrificial layer, 100-nm-thick daughter metal layers are also produced, demonstrating the flexibility of this technique.
© (2006) Society of Photo-Optical Instrumentation Engineers (SPIE)
Shyamala Subramanian, Jeffrey M. Catchmark, "Molecular ruler lithography using sacrificial host structures fabricated using electron beam lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 5(4), 049701 (1 October 2006). https://doi.org/10.1117/1.2401140 . Submission:
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