1 October 2006 Molecular ruler lithography using sacrificial host structures fabricated using electron beam lithography
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J. of Micro/Nanolithography, MEMS, and MOEMS, 5(4), 049701 (2006). doi:10.1117/1.2401140
Abstract
Molecular ruler nanolithography combines conventional lithography techniques with chemical self-assembly methods to improve the resolution of the existing lithography tools. We demonstrate the implementation of molecular ruler nanolithography using sacrificial multilayer host structures defined by electron-beam lithography. Using this process, 40-nm metal features are produced using host features spaced 100 nm apart. Using a thicker sacrificial layer, 100-nm-thick daughter metal layers are also produced, demonstrating the flexibility of this technique.
Shyamala Subramanian, Jeffrey M. Catchmark, "Molecular ruler lithography using sacrificial host structures fabricated using electron beam lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 5(4), 049701 (1 October 2006). http://dx.doi.org/10.1117/1.2401140
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KEYWORDS
Lithography

Gold

Nanolithography

Metals

Molecular self-assembly

Electron beam lithography

Molecular assembly

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