1 January 2007 Effect of process parameters and packing density on development times for densely packed high-aspect-ratio SU-8 microstructures in x-ray lithography
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J. of Micro/Nanolithography, MEMS, and MOEMS, 6(1), 013003 (2007). doi:10.1117/1.2712868
Abstract
We investigate the development time for densely packed high-aspect-ratio SU-8 structures. We find that a simple notch model as used by other workers to predict development time for isolated structures is inadequate for our case. We develop a theoretical model that allows the effects of mass transport of the resist in the developer to be included. By calibrating the process, we find that we are able to predict development time for our structures.
Kaushal Dhirendra Vora, Bor-Yuan Shew, Erol C. Harvey, J. P. Hayes, Andrew G. Peele, "Effect of process parameters and packing density on development times for densely packed high-aspect-ratio SU-8 microstructures in x-ray lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 6(1), 013003 (1 January 2007). http://dx.doi.org/10.1117/1.2712868
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KEYWORDS
Acoustics

Diffusion

Photomasks

X-rays

X-ray lithography

Calibration

Resistance

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