1 January 2007 Effect of process parameters and packing density on development times for densely packed high-aspect-ratio SU-8 microstructures in x-ray lithography
Author Affiliations +
Abstract
We investigate the development time for densely packed high-aspect-ratio SU-8 structures. We find that a simple notch model as used by other workers to predict development time for isolated structures is inadequate for our case. We develop a theoretical model that allows the effects of mass transport of the resist in the developer to be included. By calibrating the process, we find that we are able to predict development time for our structures.
© (2007) Society of Photo-Optical Instrumentation Engineers (SPIE)
Kaushal Dhirendra Vora, Kaushal Dhirendra Vora, Bor-Yuan Shew, Bor-Yuan Shew, Erol C. Harvey, Erol C. Harvey, J. P. Hayes, J. P. Hayes, Andrew G. Peele, Andrew G. Peele, } "Effect of process parameters and packing density on development times for densely packed high-aspect-ratio SU-8 microstructures in x-ray lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 6(1), 013003 (1 January 2007). https://doi.org/10.1117/1.2712868 . Submission:
JOURNAL ARTICLE
7 PAGES


SHARE
RELATED CONTENT

Deformation and stress in PMMA during hard x ray exposure...
Proceedings of SPIE (September 02 1999)
Heating of x-ray masks during e-beam writing
Proceedings of SPIE (June 24 1999)
High-aspect-ratio structure formation in x-ray lithography
Proceedings of SPIE (October 19 2000)
Regular microfilters based on PTFE
Proceedings of SPIE (June 24 1999)

Back to Top