1 April 2007 Plasma cleaning of lithium off of collector optics material for use in extreme ultraviolet lithography applications
Author Affiliations +
J. of Micro/Nanolithography, MEMS, and MOEMS, 6(2), 023005 (2007). doi:10.1117/1.2750651
Abstract
One of the critical issues within extreme ultraviolet lithography is mirror lifetime and the degradation due to debris from the pinch. This research investigated and showed the efficacy of using a helium secondary plasma and heat for removal of Li debris from collecting on the surface of collector optics. A He helicon plasma, which minimizes self-biasing and sputtering, has good extreme ultraviolet (EUV) photon wavelength transmission and preferential sputtering of lithium compared to other collector optics material. Through the combined use of heating and a He secondary plasma, EUV collector sample surface roughness and surface composition was able to be maintained near as-received status. The use of the He secondary plasma while the collector optics sample is exposed to Li debris shows promise as an in situ cleaning process for collector optics and can extend the lifetime of collector optics.
Martin John Neumann, Reece A. DeFrees, Huatan Qiu, David N. Ruzic, Oleg V. Khodykin, Alexander I. Ershov, Robert L. Bristol, "Plasma cleaning of lithium off of collector optics material for use in extreme ultraviolet lithography applications," Journal of Micro/Nanolithography, MEMS, and MOEMS 6(2), 023005 (1 April 2007). http://dx.doi.org/10.1117/1.2750651
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KEYWORDS
Plasma

Lithium

Mirrors

EUV optics

Extreme ultraviolet

Extreme ultraviolet lithography

Ions

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