Melanie M. Kessels,M. El Bouz Ecole Nationale Supérieure des Télécommunications Bretagne (France) R. Pagan MIVA Technologies GmbH (Germany) Kevin J. Heggarty Ecole Nationale Supérieure des Télécommunications Bretagne (France)
A versatile photolithographic photoplotter based on a standard photoreduction stepper, where the reticle is replaced by a commercial liquid crystal microdisplay, is reported. The microdisplay module is designed as a drop-in replacement, allowing the photoplotter to be simply and quickly converted into a standard stepper, making it an extremely versatile, low-cost research and development tool. Binary and multilevel plotting are demonstrated with plot rates of several Mpixels/s and 1-μm feature sizes into standard industrial photoresist. The limitations on plot rate and resolution are presented and techniques for overcoming them discussed.
Melanie M. Kessels,
M. El Bouz,
R. Pagan,
Kevin J. Heggarty,
"Versatile stepper based maskless microlithography using a liquid crystal display for direct write of binary and multilevel microstructures," Journal of Micro/Nanolithography, MEMS, and MOEMS 6(3), 033002 (1 July 2007). https://doi.org/10.1117/1.2767331
Melanie M. Kessels, M. El Bouz, R. Pagan, Kevin J. Heggarty, "Versatile stepper based maskless microlithography using a liquid crystal display for direct write of binary and multilevel microstructures," J. Micro/Nanolith. MEMS MOEMS 6(3) 033002 (1 July 2007)