1 July 2007 Versatile stepper based maskless microlithography using a liquid crystal display for direct write of binary and multilevel microstructures
Author Affiliations +
J. of Micro/Nanolithography, MEMS, and MOEMS, 6(3), 033002 (2007). doi:10.1117/1.2767331
Abstract
A versatile photolithographic photoplotter based on a standard photoreduction stepper, where the reticle is replaced by a commercial liquid crystal microdisplay, is reported. The microdisplay module is designed as a drop-in replacement, allowing the photoplotter to be simply and quickly converted into a standard stepper, making it an extremely versatile, low-cost research and development tool. Binary and multilevel plotting are demonstrated with plot rates of several Mpixels/s and 1-μm feature sizes into standard industrial photoresist. The limitations on plot rate and resolution are presented and techniques for overcoming them discussed.
Melanie M. Kessels, M. El Bouz, R. Pagan, Kevin J. Heggarty, "Versatile stepper based maskless microlithography using a liquid crystal display for direct write of binary and multilevel microstructures," Journal of Micro/Nanolithography, MEMS, and MOEMS 6(3), 033002 (1 July 2007). http://dx.doi.org/10.1117/1.2767331
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KEYWORDS
Spatial light modulators

LCDs

Photoresist materials

Binary data

Optical lithography

Photomasks

Prototyping

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