Nonlinear interferometric lithography for arbitrary two-dimensional patterns

Sean J. Bentley

doi:10.1117/1.2838591

1 January 2008 Nonlinear interferometric lithography for arbitrary two-dimensional patterns

Sean J. Bentley

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 7, Issue 1, 013004 (January 2008). https://doi.org/10.1117/1.2838591

Abstract

A new, relatively simple experimental technique for generating arbitrary, two-dimensional patterns with high visibility and higher resolution than allowed by the Rayleigh criterion has been developed. The theoretical and experimental details of the method, based on repeated phase-coherent interference of four beams on a multiphoton absorber, are described. A sample pattern generated by numerical computer simulation of the technique is also shown.

©(2008) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Sean J. Bentley "Nonlinear interferometric lithography for arbitrary two-dimensional patterns," Journal of Micro/Nanolithography, MEMS, and MOEMS 7(1), 013004 (1 January 2008). https://doi.org/10.1117/1.2838591

Published: 1 January 2008

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