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1 January 2008 Auxiliary pattern-based optical proximity correction for better printability, timing, and leakage control
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©(2008) Society of Photo-Optical Instrumentation Engineers (SPIE)
Andrew B. Kahng, Swamy V. Muddu, and Chul-Hong Park "Auxiliary pattern-based optical proximity correction for better printability, timing, and leakage control," Journal of Micro/Nanolithography, MEMS, and MOEMS 7(1), 013002 (1 January 2008). https://doi.org/10.1117/1.2898504
Published: 1 January 2008
JOURNAL ARTICLE
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